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MICROPOSIT S1800 SERIES - AMOLF
WebRemoval . MEGAPOSIT SPR220 photoresist can be removed with MICROPOSIT REMOVER 1165. A two-bath process is recommended with each bath at a temperature of 80°C (176°F). The first bath removes the bulk of the photoresist and the second removes residual traces of photoresist. Please consult specific remover data sheets for additional process ... WebSHIPLEY MICROPOSIT REMOVER 1165 is a mixture of pure organic solvents specifically formulated to remove all Shipley MICROPOSIT and MEGAPOSIT@ PHOTORESISTS. It is par- ticularty recommended for use in applications where the photo- resist has seen high temperatures, strong etchants, or other harsh processing conditions. derivative beneficiary 245i
Safety Data Sheets (SDS) – The KNI Lab at Caltech
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